ASTM E2245-2005 用光学干涉仪测量反射薄膜残余应力的标准试验方法

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【英文标准名称】:StandardTestMethodforResidualStrainMeasurementsofThin,ReflectingFilmsUsinganOpticalInterferometer
【原文标准名称】:用光学干涉仪测量反射薄膜残余应力的标准试验方法
【标准号】:ASTME2245-2005
【标准状态】:现行
【国别】:
【发布日期】:2005
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:E08.05
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:影片;干涉仪;光学的;摄影;残留物;应变测量;薄膜
【英文主题词】:cantilevers;combinedstandarduncertainty;fixed-fixedbeams;interferometry;lengthmeasurements;microelectromechanicalsystems;MEMS;polysilicon;residualstrain;stiction;straingradient;teststructure
【摘要】:ResidualstrainmeasurementsareanaidinthedesignandfabricationofMEMSdevices.ThevalueforresidualstrainisusedinYoungrsquo;moduluscalculations.1.1Thistestmethodcoversaprocedureformeasuringthecompressiveresidualstraininthinfilms.Itappliesonlytofilms,suchasfoundinmicroelectromechanicalsystems(MEMS)materials,whichcanbeimagedusinganinterferometer.Measurementsfromfixed-fixedbeamsthataretouchingtheunderlyinglayerarenotaccepted.1.2Thistestmethodusesanon-contactopticalinterferometerwiththecapabilityofobtainingtopographical3-Ddatasets.Itisperformedinthelaboratory.1.3Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:N50
【国际标准分类号】:37_040_20
【页数】:20P.;A4
【正文语种】: